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Single Photon Source Lithography Engineer

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EMP:Technology
Palaiseau, France
Tiempo Completo
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Descripción

Quandela is a global leader in quantum computing, designing, building, and delivering cutting-edge quantum solutions for research and industry.

Its offerings include the most energy-efficient quantum computers for data centers, full-stack quantum computing solutions accessible via the cloud, and algorithm access services for academic and industrial customers.

  • Following a pragmatic, step-by-step roadmap, Quandela has been deploying industrial-grade systems since 2023 while developing future generations of fault-tolerant quantum computers capable of scaling through the integration of thousands of photonic components.

Quandela is committed to making quantum computing accessible to all in order to address the most complex industrial and societal challenges.

Learn more at: Quandela | Leading Photonic Quantum Computing Solutions.

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this position:Role Overview We are looking for a Single Photon Source Lithography Engineer to support the development, stabilization and industrialization of our semiconductor fabrication processes. At our current stage of maturity, this position combines advanced process development, hands-on R&D and manufacturing engineering

The Lithography Engineer will play a key role in bridging the gap between Advanced R&D and Production, transforming newly developed process building blocks into robust, repeatable and scalable manufacturing processes.

 The role will have a strong focus on in-situ localization of quantum dots (QDs) at cryogenic temperatures and laser lithography over the localized Qds with laser writing techniques.

The successful candidate will work closely with R&D teams, fabrication engineers, equipment owners and cleanroom operators to improve process capability, reproducibility, yield and production throughput.

 This is a highly hands-on position requiring a strong understanding of semiconductor fabrication, rigorous experimental methodology and the ability to investigate complex interactions between process parameters and device.

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