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ALD Lab - Working Student

CompraTica Empleos

EMP:Technology
Aachen, Germany
Tiempo Completo
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Descripción

Your RoleAs an ALD Lab Working Student, you will support the daily operation of our Atomic Layer Deposition (ALD) tool and the relevant metrology tools in the FabONE cleanroom in Aachen.

Working alongside our ALD process engineers, you will prepare samples, perform routine thin-film characterization, and maintain accurate laboratory records.

This is a hands-on opportunity to gain practical experience with semiconductor processing, metrology tools, and cleanroom operations while contributing to our ongoing research and development activities.

What You’ll DoPrepare samples for ALD and characterization runs.

  • Perform routine thin-film measurements using spectroscopic ellipsometry, Raman spectroscopy, optical microscopy and AFMSupport senior ALD process engineers with setting up tool test runs and recording operational parametersHandle delicate samples and cleanroom equipment in accordance with established safety and quality proceduresDocument characterization results and upload structured metrology data to central repositoriesOrganize measurement data and prepare clear summaries of film-characterization resultsHelp establish and maintain an inventory system for chemicals and precursorsWhat You BringCurrent enrolment in a bachelor’s or master’s program in materials science, physics, chemistry, mechanical engineering, electrical engineering or a related field, ideally in the last year.

A basic understanding of thin-film characterization methods such as ellipsometry, Raman spectroscopy, optical microscopy or AFMStrong attention to detail and the ability to handle delicate samples accuratelyAn interest in semiconductor processing and a willingness to learn cleanroom protocolsBasic proficiency in data logging, documentation and data visualization using Excel or PythonGood communication.

Habilidades

in EnglishThe ability to work effectively and reliably within a laboratory teamWhat We OfferHands-on experience with ALD processes, thin-film characterization and semiconductor laborator...

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